Beilstein J. Nanotechnol.2017,8, 2181–2185, doi:10.3762/bjnano.8.217
that near-field etching is an effective way to etch on the scale of less than 10 nm for both wet and dry etching techniques. In addition, near-field dry etching may be effective for the selective etching of nanoscale structures with large mean free path values.
Keywords: Angstrom-scaleflatness
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Figure 1:
Schematic of the near-field etching process.